FUJIFILM Electronic Materials provides a comprehensive range of metal ion free (MIF) photoresist developers suitable for immersion and in-line track development.

In addition, metal ion containing (MIC) developers are available to those customers that continue to use this technology.

  • Proprietary multi-component formulations with surfactant additives
  • Packaging options :
    • 4 x 4L bottles
    • 200L drums (one way and returnable)
    • 1000L IBC’s
    • Bulk delivery
  • OPD 262 : developer without surfactant
  • OPD 4262 : developer with broadly applicable surfactant
  • OPD 4280 : developer with broadly applicable surfactant

    Other alkalinities and surfactant families are also available.
    Contact Us for more information

  • WNRD : negative resist developer

Contact Us for more information

We offer a full range of high purity Metal Ion Free (MIF) & Metal Ion Containing (MIC) developers for the lithographic patterning of negative photoresist, g-line, i-line and advanced photoresists