Etchants

• Different grades depending on the etchant type
• Certain products are offered with or without surfactant
• See our Product Overview for the different Etchant types and their typical application
• Packaging options :
  • 4 L HDPE bottle
  • 20L Jerri can
  • 200 L drum

• Buffered Oxide Etchants
  • Fujifilm has advanced capabilities for the precise blending of Buffered Etchants with tight assay specification ranges, available in multiple NH4F:HF ratios
  • Utilized to etch SiO2 films
  • Utilized as pre-diffusion and pre-metallization surface preparations
  • Formulated from high purity 49% Hydrofluoric Acid and high purity 40% Ammonium Fluoride
  • Available with and without surfactant
• Dilute HF
  • Fujifilm has advanced capabilities for the precise blending of dilute HF with tight assay specification ranges
• Freckle Etch
  • For the removal of residual silicon nodules left after etching aluminum-silicon-copper layers
• Mixed Acid Etchants
  • For the isotropic etching of silicon (mono and poly-crystalline)
• Specialty Pad Etchants
  • Used to etch deposited pyro lytic and sputtered final passivation glasses in order to expose semiconductor bonding pads for wire bonding
  • Available with and without our OHS surfactant
• Specialty Metal Etchants
  For the selective removal of specific metal layers Fujifilm offers various specialty etchants, including
  • Specialty Aluminum Etchants: Immersion etchants for aluminum metallization layers - Available with or without the Fujifilm Aluminum Etch Surfactant (AES)
  • Chrome Etch: a specialty blend for the patterning of Chromium layers

Contact Us for more information

See our Product Overview for the different Etchant types and their typical application

• Cleaners
• Photoresists
• Photoresist Ancillaries